实验分析：
上图演示的是沟槽夹断现象。在用PECVD进行淀积的时候，随着淀积过程的不断进行，膜在间隙入口出产生夹断现象，并且导致在间隙填充中的空洞，影响电学特性和长期可靠性。为了避免这一现象的产生，我们可以采用HDPCVD进行淀积。HDPCVD即高密度等离子体CVD，它的主要优点在于可以在300到400摄氏度较低的淀积温度下，制备出能够填充高深宽比间隙的膜。
二、扩散 24.1:1. go athena
#TITLE: Simple Boron Anneal
#the x dimension definition line x loc = 0.0 spacing=0.1 line x loc = 0.1 spacing=0.1
#the vertical definition
line y loc = 0 spacing = 0.02 line y loc = 2.0 spacing = 0.20
#initialize the mesh init silicon c.phos=1.0e14
#perform uniform boron implant implant boron dose=1e13 energy=70
#perform diffusion
diffuse time=30 temperature=1000 #
extract name=\
#save the structure
structure outfile=andfex01.str
#plot the final profile tonyplot andfex01.str quit
实验截图:
实验分析：
上图实验为硼的注入和退火的过程。红、绿、蓝线分别表示硼、
磷以及净掺杂。注入后形成高斯分布。随着硼浓度的下降，净掺杂浓度等于磷的浓度。离子注入通过高压离子轰击把杂质引入硅片，杂质通过与硅片发生原子级的高能碰撞，才能被注入。离子注入会将原子撞击出晶格结构而损伤硅片晶格。退火能够加热被注入硅片，修复晶格缺陷，还能使杂质原子移动到晶格点，将其激活，最小化杂质扩散。
24.1:2.
go athena
# OED of Boron
#the x dimension definition line x loc = 0.0 spacing=0.1 line x loc = 0.1 spacing=0.1
#the vertical definition
line y loc = 0 spacing = 0.02 line y loc = 2.0 spacing = 0.20 line y loc = 25.0 spacing = 2.5
#initialize the mesh init silicon c.phos=1.0e14
#perform uniform boron implant implant boron dose=1e13 energy=70
#set diffusion model for OED method two.dim
#perform diffusion
diffuse time=30 temperature=1000 dryo2 #
extract name=\
#save the structure
structure outfile=andfex02_0.str
# repeat the simulation with default FERMI model go athena
#TITLE: Simple Boron Anneal
#the x dimension definition line x loc = 0.0 spacing=0.1 line x loc = 0.1 spacing=0.1
#the vertical definition
line y loc = 0 spacing = 0.02 line y loc = 2.0 spacing = 0.20
line y loc = 25.0 spacing = 2.5
#initialize the mesh init silicon c.phos=1.0e14
#perform uniform boron implant implant boron dose=1e13 energy=70
#select diffusion model method fermi
#perform diffusion
diffuse time=30 temperature=1000 dryo2 #
extract name=\
#save the structure
structure outfile=andfex02_1.str
# compare diffusion models
tonyplot -overlay andfex02_0.str andfex02_1.str -set andfex02.set
实验截图：
